Barium bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)barium 二(6,6,7,7,8,8,8-七氟-2,2-二甲基-3,5-辛二酮)钡
CAS 36885-31-1 MFCD00070455
化学结构图
SMILES: CC(C)(C)/C(=C/C(=O)C(F)(F)C(F)(F)C(F)(F)F)/O[Ba]O/C(=C\C(=O)C(F)(F)C(F)(F)C(F)(F)F)/C(C)(C)C
化学属性
| Mol. Formula | C20H20BaF14O4 |
|---|---|
| Mol. Weight | 727.71 |
| Appearance | white to off-white pwdr. |
| Boiling Point | dec. 280-300°C (subl. 210°C/0.2mm) |
| Melting Point | 194-198°C |
别名和识别编码
| Chemical Name | Barium bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)barium |
|---|---|
| Synonym | Ba(FOD)2 二(6,6,7,7,8,8,8-七氟-2,2-二甲基-3,5-辛二酮)钡 |
| PubChem Substance ID | 24872955 |
| Chemical Name Translation | 二(6,6,7,7,8,8,8-七氟-2,2-二甲基-3,5-辛二酮)钡 |
| MDL Number | MFCD00070455 |
| CAS Number | 36885-31-1 |
信息真实价格透明
资金保障
专业采购外包团队在线服务
信息真实价格透明
资金保障
专业采购外包团队在线服务
品牌质保精细包装
现货库存
一流品牌服务
分类
- {SNA} Barium, Micro/NanoElectronics, Solution Deposition Precursors, 材料科学
- Barium, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors
- {SA} Barium, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors
安全信息
GHS Symbol
- H332 Harmful if inhaled 吸入有害
- H302 Harmful if swallowed 吞食有害
- S28 After contact with skin, wash immediately with plenty of ... (to be specified by the manufacturer) 皮肤接触后，立即用大量…（由生产厂家指定）冲洗；
- R20/22 Harmful by inhalation and if swallowed 吸入和不慎吞咽有害
