Tris(tetramethylcyclopentadienyl)gadolinium(III) 三(四甲基环戊基)钆(III)
CAS 308847-85-0 MFCD01862470
化学结构图
SMILES: [Gd].C[C]1[CH][C](C)[C](C)[C]1C.C[C]1[CH][C](C)[C](C)[C]1C.C[C]1[CH][C](C)[C](C)[C]1C |^1:2,3,4,6,8,11,12,13,15,17,20,21,22,24,26|
化学属性
| Mol. Formula | [(CH3)4C5H]3Gd |
|---|---|
| Mol. Weight | 521 |
| Appearance | orange pwdr. |
| Stability | air sensitive, moisture sensitive |
别名和识别编码
| Chemical Name | Tris(tetramethylcyclopentadienyl)gadolinium(III) |
|---|---|
| PubChem Substance ID | 24873440 |
| Chemical Name Translation | 三(四甲基环戊基)钆(III) |
| Synonym | 三(四甲基环戊二烯)钆(III) |
| MDL Number | MFCD01862470 |
| CAS Number | 308847-85-0 |
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分类
- {SA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Gadolinium, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors
- {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Gadolinium, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors
- {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Gadolinium, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
- {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Gadolinium,
安全信息
GHS Symbol
- P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
- H228 Flammable solid 易燃固体
- S43 In case of fire use ... (indicate in the space the precise type of fire-fighting equipment. If water increases the risk add -?Never use water) 着火时使用（指明具体的消防器材种类，如果用水增加危险，注明“禁止用水”
- S7 Keep container tightly closed 保存在严格密闭容器中；
- R14 Reacts violently with water 遇水会猛烈反应
