TRIS(TETRAMETHYLCYCLOPENTADIENYL)LANTHANUM(III) 三(四甲基环戊二烯)镧(III)

CAS 148607-23-2 MFCD01863709

化学结构图

148607-23-2
SMILES: [La].C[C]1[CH][C](C)[C](C)[C]1C.C[C]1[CH][C](C)[C](C)[C]1C.C[C]1[CH][C](C)[C](C)[C]1C |^1:2,3,4,6,8,11,12,13,15,17,20,21,22,24,26|

化学属性

Mol. FormulaC27H39La
Mol. Weight502.50

别名和识别编码

Chemical NameTris(tetramethylcyclopentadienyl)lanthanum(III)
MDL NumberMFCD01863709
PubChem Substance ID24873680
CAS Number148607-23-2
Chemical Name Translation三(四甲基环戊二烯)镧(III)
Synonym 三(四甲基环戊二烯)镧(III)
信息真实价格透明    资金保障    专业采购外包团队在线服务   
信息真实价格透明    资金保障    专业采购外包团队在线服务   
品牌质保精细包装    现货库存    一流品牌服务   

分类

  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lanthanum, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lanthanum, Lanthanum Catalysts, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
  • {SA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Lanthanum, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P422 Store contents under… 存储目录在…之下。
  • P231+P232
Signal word Danger
Hazard statements
  • H261 In contact with water releases flammable gas 与水接触时释放可燃气体。
Hazard Codes F
Personal Protective Equipment Eyeshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
Safety Statements
  • S16 Keep away from sources of ignition - No smoking 远离火源，禁止吸烟；
Risk Statements
  • R11 Highly flammable 非常易燃
  • R14 Reacts violently with water 遇水会猛烈反应

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Lanthanum - Catalysis and Inorganic Chemistry
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Lanthanum - CVD and ALD Precursors by Metal

相关产品推荐