1,1,3,3-TETRAMETHYL-1,3-BIS[2-(5-NORBORNEN-2-YL)ETHYL]DISILOXANE 1,1,3,3-四甲基-1,3-二[2-(5-降冰片烯-2-基)乙基]二硅氧烷，内型和外型混合物
CAS 198570-39-7 MFCD02093771
化学结构图
SMILES: C[Si](C)(CCC1CC2CC1C=C2)O[Si](C)(C)CCC1CC2CC1C=C2
化学属性
| Mol. Formula | C22H38OSi2 |
|---|---|
| Mol. Weight | 374.71 |
| Density | 0.944 g/mL at 25 °C(lit.) |
| Boiling Point | 272-303 °C(lit.) |
| Refractive index | n20/D 1.483(lit.) |
别名和识别编码
| Chemical Name | 1,1,3,3-Tetramethyl-1,3-bis[2-(5-norbornen-2-yl)ethyl]disiloxane, mixture of endo and exo |
|---|---|
| MDL Number | MFCD02093771 |
| PubChem Substance ID | 24874350 |
| CAS Number | 198570-39-7 |
| Chemical Name Translation | 1,1,3,3-四甲基-1,3-二[2-(5-降冰片烯-2-基)乙基]二硅氧烷，内型和外型混合物 |
| Synonym | 1,1,3,3-四甲基-1,3-二[2-(5-降冰片烯-2-基)乙基]二硅氧烷，内型和外型混合物 |
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分类
- {SA} Alicyclic/Etch-Resistant Monomers, Chemical Synthesis, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Nanomaterials, Organometallic Reagents, Organosilicon,
- {SNA} Alicyclic/Etch-Resistant Monomers, Chemical Synthesis, Lithography Monomers, Micro/NanoElectronics, Monomers, Nanomaterials, Organometallic Reagents, Organosilicon, POSS Intermediates, POSS Precursors and Intermediates, Polymer Science, Self Assembly and Lithography, Silicone Monomers, Siloxanes, Silsesquioxanes: POSS Nanohybrids, 材料科学
