Bis(Isopropylcyclopentadienyl)Tungsten Dihydride 双(异丙基环戊二烯)二氢化钨
CAS 64561-25-7 MFCD04126431
化学结构图
SMILES: [WH2].CC(C)[C]1[CH][CH][CH][CH]1.CC(C)[C]1[CH][CH][CH][CH]1 |^1:4,5,6,7,8,12,13,14,15,16|
化学属性
| Mol. Formula | (C5H4CH(CH3)2)2WH2 |
|---|---|
| Mol. Weight | 400.20 |
| Boiling Point | 230 °C(lit.) |
| Refractive index | n20/D 1.6(lit.) |
| TSCA | No |
别名和识别编码
| Chemical Name | Bis(Isopropylcyclopentadienyl)Tungsten Dihydride |
|---|---|
| MDL Number | MFCD04126431 |
| PubChem Substance ID | 24873641 |
| CAS Number | 64561-25-7 |
| Chemical Name Translation | 双(异丙基环戊二烯)二氢化钨 |
| Synonym | 双(异丙基环戊二烯)二氢化钨(IV) |
| LabNetwork Molecule ID | LN02144944 |
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分类
- {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Tungsten, Tungsten Catalysts, Vapor Deposition Precursors, 材料科学
- {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Tungsten, Vapor Deposition Precursors
- {SA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Tungsten, Vapor Deposition Precursors
安全信息
- S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
- S37 Wear suitable gloves 戴适当手套；
- S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
- R10 Flammable 易燃
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
- R14 Reacts violently with water 遇水会猛烈反应
